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the Wake Forest University - Nano and Quantum Technologies Laboratory
Lithography
Suss Mask Aligners: 3 x upgraded, mechanical MJB3 systems setup for: Deep UV band, Middle UV band, and Low band. Backside alignment available
Focussed Ion Beam: FIB is a FEI 200M with a rebuild from TSS
Nabity NPGS: e-beam lithography built on a Zeiss Supra 25 with Schottky Field emission gun. System also has EDAX system.
Resist Spinners: 2 x Laurell spinners with vacuum chucks and programmable
DPN 2000 dip pen lithography system
Wet Benches with acid and base hoods, refrigerated storage, and vented chemical storage
Processing Ovens: standard cleanroom compliant vacuum ovens for processing
Mask design software: used to design masks and allows circuit simulation
Deposition/Etching
Thermal Evaporation Edwards thermal evaporator system cleanroom compatible.
AC/DC Sputtering Kurt Lesker Nano 36
e Beam Evaporator Kurt Lesker, cryopumped AXXIS system with e-beam evaporation, and two sputter sources
PECVD system: Oxford Plasma 80 Plus. Gases: SiH4, NH3, N2O, N2, O2, and CF4
Ar / O2 plasma etcher/asher
UV ozone cleaner
Reactive ion etcher (RIE): Oxford plasma 80 plus.
