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Wake Forest University
Center for Nanotechnology and Quantum Materials
NanoteQ
Metrology Cluster
RM98
Tencor KLA alpha step 500 / IQ surface stylus profilometer for determining film thickness.
Gaertner Ellipsometer single wavelength, for measuring film thickness
Olympus M60 microscope for surface analysis with digital imaging and spectral analysis using an ocean optics add-on.
Alessi probe station with LRC, multimeter, power meter, and spectrum analysis. RF/DC/AC capable with two vector analysis systems covering up to 8 GHz.
Video's do not replace onsite training and approval by lab manager. These are provided as a reminder as to proper use.
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